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Product: Luxology Releases Modo 203

Product: Luxology Releases Modo 203

March 13, 2007 | By Brandon Boyer

March 13, 2007 | By Brandon Boyer
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Representatives from 3D content creation software company Luxology have announced the latest release of its Front Line Award winning next-generation 3D content creation software, modo 203.

The latest version of modo boasts upgrades to a number of new features, including a newly improved UV unwrap tool, with less angular and proportional distortion, as well as an improved UV pinning function and a move and sew option for UV editing, UV copying and pasting, and a new UV orient capability to line up UVs horizontally or vertically.

The modo renderer has also been sped up by as much as 1.4 times, according to internal tests, with ambient occlusion and full light baking operations also getting a speed boost from ray-tracing improvement, and optimized irradiance caching.

The new version of modo also includes a new DXF plug-in to read and write ASCII DXF files from inside modo, allowing architects and designers to use modo to import a range of 2D and 3D entities from DXF files; including: polymesh, arcs, circles, lines, points, polylines and more.

Modo's export functionality now also includes a new translator to convert modo triangles and quads into a polymesh, with maintained vertex connectivity, extending modos pipeline integration capabilities and allowing it to be used with many design software tools that support DXF.

Said Luxology president Brad Peebler, This is another shot of modo goodness that makes modo that much better. The technology we are introducing for UV editing really elevates modo to best in class in this critically important phase of 3D workflow. We also added a DXF translator for customers in the design and architectural visualization fields and made our wicked-fast renderer even faster.


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